The heat treating furnaces with electric resistance heating and chamber system are suitable for melting, annealing and heat treating of various materials in a temperature of max. 1100 °C. The equipment can be used for industrial and laboratory purposes. The compact furnace includes every component. Underneath the heating chamber is an electrical switch, control unit suitable for PID-type programmable temperature control. Power semiconductor switches are applied.
Laboratory furnaces
| Type | W | H | D | liter | power in kW | V |
| LK-1 | 170 | 100 | 180 | 3 | 2 | 230 |
| LK-2 | 170 | 100 | 240 | 4 | 2,5 | 230 |
| LK-3 | 170 | 100 | 360 | 6 | 3 | 230 |
Specifications are for informational purposes only and may vary depending on the circumstances of the application.
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